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ORC Seminar Series
“3D Direct-Laser-Writing Lithography for Nanophotonics and Biology”
Speaker: Professor Martin Wegener, Karlsruhe Institute Technology (KIT) Karlsruhe, Germany
Date: 26 March 2010
Venue: L/T B in Bldg 46
Abstract: Direct laser writing (DLW) can be viewed as the three-dimensional analogue of planar electron-beam lithography. Throughout recent years, DLW has matured from a laboratory curiosity to a mature commercially available technology allowing down to 100-nm lateral features. Research aiming at further improving the resolution by using stimulated emission depletion (STED) DLW will be reported. Furthermore, I will outline several examples for applications of DLW: 3D photonic metamaterials, 3D photonic (quasi-)crystals, 3D invisibility cloaks, and 3D scaffolds for cell growth.
Biography: After completing his PhD in physics in 1987 at Johann Wolfgang Goethe-Universität Frankfurt (Germany), he spent two years as a postdoc at AT&T Bell Laboratories in Holmdel (U.S.A.). From 1990-1995 he was C3-Professor at Universität Dortmund (Germany), since 1995 he is C4-Professor at Universität Karlsruhe (TH). Since 2001 he has a joint appointment at Institut für Nanotechnologie of Forschungszentrum Karlsruhe GmbH. Since 2001 he is also the coordinator of the DFG-Center for Functional Nanostructures (CFN) in Karlsruhe. His research interests comprise ultrafast optics, (extreme) nonlinear optics, near-field optics, photonic crystals, photonic metamaterials, and transformation optics.
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